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Horizontal vacuum resistance furnaces are designed for carrying out various technological processes in high vacuum at temperatures up to 1600 degrees. The furnace can be used in electronic, radio engineering, aviation, rocket and other industries. The main areas of application are the technological processes of annealing, quenching, degassing and sintering.

Vacuum chambers can be used: for drying materials (low vacuum), testing spacecraft, during experiments on plasma retention and antimatter production, as elements of charged particle accelerator systems and systems for applying thin films. Vacuum chambers can be used: for drying materials (low vacuum), testing spacecraft, during experiments on plasma retention and antimatter production, as elements of charged particle accelerator systems and systems for applying thin films.

Vacuum valves are designed to cut off and seal the elements of the vacuum system, thereby, vacuum valves provide the necessary sequence of pumping and air intake. The vacuum valves presented in this section are mass-produced by NPO Helikon.

Regulated switching power supplies with highly stable output characteristics Digital display of set and actual value, voltage and current (4 digits, LED) Electronic load switching on/off Protection against overload, short circuit, overheating and reverse polarity Low ripple output voltage less than 2mV Low ripple output current less than 5mA Minimum discreteness of setting output voltage and current 0.007/0.005 Operating modes: stabilization U and I, dynamic load RS-232 interface