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They are designed for carrying out various technological processes at temperatures from 40 to 500 oC, in vacuum up to 1x10−3 mmHg, or in an inert gas of high purity. They are used for drying, light annealing, aging, low and medium tempering in an oxidizing environment, degassing of ferrous and non-ferrous metals (including copper and copper alloys), or any other materials processed under similar conditions. The program setting of heat treatment modes including vacuuming, high purity inert gas intake with repeated vacuuming allows heating in an oxidizing environment with high purity of the surfaces of the processed parts, without scale formation and oxidation

ConFlat (CF) standard connections are used to ensure the connection of components of vacuum systems operating in the field of high and ultra-high vacuum.

The vacuum pump chamber is made of fluoroplastic, and other parts are coated with fluoroplastic, which ensures the high chemical resistance of the pump. It has a pumping speed of gases and vapors of 38 l/min at an extreme vacuum of 60 mbar. It is quite compact, so it can be placed in almost any already equipped space. Valve(s) material FFKM (Perfluoro rubber) Working medium Gas Country Russia Chemical resistance Yes Overall dimensions, L×W×H, mm 289.5x160x200 Protection class acc. to DIN EN60529 IP20 Noise level, dB 75 dB Power supply 230 V, 50 Hz Ultimate vacuum, mbar abs. 60 Excess pressure, bar. Max. permissible 0.5 bar Productivity, l/min 38 Drive rotation speed, rpm 1350 Maximum current, A 1.2 Device weight, kg 7.6 Working chamber material PTFE (polytetrafluoroethylene) Equipment: Vacuum pump, cable, instructions, passport, packaging (vacuum regulator and spare parts are not included in the kit and must be ordered separately).

for carrying out heat treatment according to pre-created programs. The presence of remote control and a number of software options allows you to use the product for long-term heat treatment modes. Vacuum drying cabinets can be used for: - gentle drying of thermo- and oxygen-sensitive substances, such as food, medicinal, cosmetic products; - complete removal of residual moisture from heat-sensitive components with a complex shape, such as components of electronic equipment, jewelry, watches and other precision mechanics; - removal of air when filling the molds with a compound, followed by solidification at a given temperature; - removing air from the product and replacing it with another necessary gas medium; - tempering, annealing or aging of metals with the appropriate processing temperature in a vacuum or protective environment; - drying of products after washing in flammable solvents (special version); - testing of devices under low pressure conditions under various temperature conditions.

For scientific and industrial applications.

The helium leak detector TI1-50M is a universal highly sensitive device designed to test the tightness of various systems and objects that allow pumping out the internal cavity, as well as those filled with helium or a mixture containing helium, and detect (localize) places of leakage (leaks). Specifications: Measuring range at the leak detector inlet, Pa•m3/s from 5•10-13 to 1•10-5; Range of indications when working by probe method, Pa•m3/s from 1•10-9 to 1•10-5; Time to enter the readiness mode for measurements, no more than, min 5; AC supply voltage, V, Hz 220±10%, 50±1; Power consumption, VA 1200; Overall dimensions (WxHxD), no more than, mm 480x470x390; Weight, no more than, kg 40; Average time to metrological failure, h 15000;

It is designed to search for leaks of freons and other halogen-containing gases, for example, gas, in working equipment, and when testing systems, including cable ones, for tightness. The GTI-8 halogen leak detector also allows detecting an increase in the concentration of such gases in the room or near the controlled object. Technical characteristics of the leak detector "GTI-8" Parameter Sensitivity of the leak detector GTI-8, m3 Pa/sec., not less 1.0 - 5.3/10e-7 Time constant, sec., no more 3 Compensation of the initial sensor current Availability Automatic background signal compensation Availability Adjustable trigger threshold Availability Food ~220V, 50Hz (14.8V for GTI-8B) For modification of GTI-8B, continuous operation time, hour, at least 8 Operating mode setting time, min, no more 5

Horizontal vacuum resistance furnaces are designed for carrying out various technological processes in high vacuum at temperatures up to 1600 degrees. The furnace can be used in electronic, radio engineering, aviation, rocket and other industries. The main areas of application are the technological processes of annealing, quenching, degassing and sintering.

Vacuum chambers can be used: for drying materials (low vacuum), testing spacecraft, during experiments on plasma retention and antimatter production, as elements of charged particle accelerator systems and systems for applying thin films. Vacuum chambers can be used: for drying materials (low vacuum), testing spacecraft, during experiments on plasma retention and antimatter production, as elements of charged particle accelerator systems and systems for applying thin films.